Avenida Mestre José Veiga
Braga
Portugal
The International Iberian Nanotechnology Laboratory (INL) is the first International Intergovernmental Organisation (IGRO) in Europe conducting world-class research and development in the field of nanoscience and nanotechnology.
INL is the result of a joint decision of the Governments of Portugal and Spain, taken in November 2005. The installation of scientific equipment began in October 2010 and from 2012 to 2017 INL has been involved in more than 50 industry driven projects, both direct and co-funded at national, European and international level.
INL is committed to work with the international community integrating the worldwide best solutions to address commercial needs, leading to increased competitiveness, creating societal value and attractive services and products.
One of the aspects that stand out at INL is its research facilities, which provides a high-tech research environment equipped with the latest technologies. The state of the art facility comprises a global investment over 100M€ and extends over a total campus area of 47.000 m2, with a construction area of 26.000 m2. This includes 7.500m2 of individual and central laboratories, including the high accuracy laboratories, a cleanroom with 1.000 m2 and an integrated incubator.
INL is member of several regional, national and European networks, namely:
•Bio Based industry European Technology Platform
•ECSEL - Electronic Components and Systems for European Leadership
•EFFRA - European Factories of the Future Research Association
•ENIAC JU - Joint Undertaking on Nanoelectronics
•EPPN - European Pilot Production Network (Project Coordinator: INL)
•EUMAT - European Technology Platform for Advanced Engineering Materials and Technologies
•ETPN - The European Technology Platform for Nanomedicine
•NANOfutures - European initiative for sustainable development by Nanotechnologies
•NIA - Nanotechnology Industries Association
INL - International Iberian Nanotechnology Laboratory
INL - International Iberian Nanotechnology Laboratory
NANOPHOTONICS
ADVANCED HIGH RESOLUTION FLUORESCENCE AND RAMAN MICROSCOPES
Confocal Light Scanning Microscope (Life cell- option) (Zeiss LSM780)
Wide Field Microscope (Life Cell – option) (Nikon Ti)
Total Internal Reflection Microscopy (TIRF) ((Nikon Ti upgrade)
Super Resolution Microscope – dSTORM (Nikon Ti upgrade)
Confocal Raman Microscope (WiTec)
OTHER MICROSCOPES AND PHOTONICS-ENABLED TECHNOLOGIES
Fluorescence Brightfield microscope (Nikon)
Flow cytometer/Cell sorter (BioRad)
Femtosecond Laser-Based Microfabrication (Spectra Physics Tsunami, Newport uFAB)
UNIQUE COMBINED IMAGING TECHNICS AT INL
Combined mechanical and optical characterization: AFM/Differential Spinning Disk
Fluorescence lifetime imaging microscopy (FLIM) setup with single molecule sensitivity, suited for life cell observation, fluorescence anisotropy detection and suited for nanomedicine research such as the investigation of photothermal or hyperthermia therapy effects on cells
Multiphoton/Second Harmonic Generation microscopy
Spectral imaging ellipsometry
OPTICAL SPECTROSCOPY TECHNICS
Fluorescence lifetime spectroscopy (TCSPC based)(ISS ChronosBH)
Fluorescence anisotropy (ISS Chronos BH)
Fluorescence lifetime and energy transfer detection (Streak camera based) (Hamamatsu)
Circular Dichroism Spectroscopy (Jasco)
FTIR spectroscopy (Bruker)
Dynamic Light Scattering (Horiba)
Fluorescence (Cross) Correlation Spectroscopy (F(C)CS) (as upgrade of the Zeiss LSM780)
Ellipsometry coupled with Quartz Crystal Balamce
NANOFABRICATION
THIN FILM DEPOSITION AND MATERIAL GROWTH AREA
Mutitarget Singulus sputtering tool for magnetic multilayers (Timaris MTM)
Multitarget confocal sputtering tool (Kenosistec)
Metallization Singulus sputtering tool for Al, TiW(N) and Al2O3 (Timaris FTM)
EasyTube 3000 Graphene CVD furnace system
SPTS MPX CVD system for oxides, oxi:nitrides and a-Si:H deposition
PECVD (800ºC) systems for CNT and carbon layers deposition tool (MicroSys 400 from Roth & Rau Microsystems)
Thin film silicon CVD system (hotwire and radio-frequency assisted, doped and intrinsic Si layers)
Cu Electroplating (AMMT GmbH)
OPTICAL AND E-BEAM LITHOGRAPHY AREA
E-beam lithography tool (Vistec 5200 ES 100 kV)
Direct write laser lithography (Heidelberg DWL 2000)
Mask aligner (Karl Suss MA BA model)
Optical resist track (Karls Suss Gamma Cluster)
E-beam resist track (Karls Suss Gamma Cluster)
Multiple ovens, including vapor priming
Coater and hotplates for substrates up to 300 mm (SCS/EMS)
ETCHING, ASHING, AND MICROMACHINING AREA
Broad Beam ion milling with SIMS end point detect (Nordiko 7500)
Fluorine based reactive ion etch system for oxides / nitrides (SPTS APS)
Chlorine based reactive ion etch systems for metals (SPTS ICP)
Silicon Deep reactive ion etching system (SPTS Pegasus)
Plasma asher (PVA TEPLA M360)
TMAH / KOH Si etch tanks (AMMT GmbH)
Multiple fume hoods and wet benches for chemical processes (Quimipol)
Oxide vapor etch release system (SPTS/PRIMAXX uEtch)
XeF2 isotropic Si etch system (Xactic X4)
Super critical CO2 point dryer (Tousimis)
ADVANCED PACKAGING, ANNEALING, AND BACK-END PROCESS AREA
Chemical mechanical Planarization (Logitech ORBIS)
Dicing saw (Disco DAD 3500)
Wire Bonder / Aluminum Wedge, Pick and Place (TPT HB)
Wire Bonder / Gold ball bond (TPT HB)
CNC – High speed milling system (FlexiCAM )
3D printers (Makerbot and bQ WITBOX)
Advanced desktop research printer (LP50 Roth & Rau B.V.)
Plotter/cutter Silhouette Cameo 12″ (Fabriprint)
Magnetic Annealer (TEL)
METROLOGY, INSPECTION AND WAFER-SCALE DEVICE TESTING AREA
High resolution SEM (NanoSEM, FEI)
Contact profilometer (KLA TENCOR P-16+)
Resistivity mapper (AITCO)
Optical profilometer/elipsometer (OPM hyperion with confocal sensor / Oceon Optics NanoCalc XR)
Multiple automated wafer probers for electrical testing and others
Manual and motorized optical microscopes for AOI
Optical microsystem analyzer for MEMS (in-plane, out-of-plane and topography; Polytec MSA 500)
Laser scanning vibrometer for MEMS (Polytec UHF-120, 1.2 GHz)
Climate chamber (Weiss WKL, -70C to 180 C, 10 to 98% rel hum)
Compact scanning bench top probe microscope (Nanosurf Flex AFM)
ADVANCED ELECTRON MICROSCOPY
X-Ray Photoelectron Spectroscopy
Dual FIB with UHREM SEM
X-ray Thin Film/Reflectometry
Atomic Force Microscope – Materials
Environmental Scanning Electron Microscope (ESEM)
Small Angle X-ray Scattering (SAXS)
Atomic Force Microscope – BioScience
Probe Corrected HRTEM
Ultrahigh vacuum scanning probe microscope
Molecular beam epitaxy system for Cu(In,Ga)Se2 materials
FTIR Spectrometer
Full-cycle multi-scale Prototyping
Depending on the needs of the specific industrial partner, INL can support the entire prototyping cycle or specific stages. By employing industry-standard processes, INL can help to ensure a successful field trial and smooth technology scale-up.